SS-Series
 

 Application purpose of Scrubber

●Remove Particles to Improve Yield

●Back-side clean to prevent De-Focusing during Photolithography Process.

●Improve chemical lifetime of wet bench liquid by pre-cleaning wafers.

●DIW Scrubber is not chemical cleaning. It can save chemical costs. Great for CoO & EHS.

 


 
 
ss2 ss4
   
   
   
   
 
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